Simultaneous nanocalorimetry and fast XRD measurements to study the silicide formation in Pd/a-Si bilayers

TítolSimultaneous nanocalorimetry and fast XRD measurements to study the silicide formation in Pd/a-Si bilayers
Tipus de publicacióJournal Article
Any de publicació2015
AutorsMolina-Ruiz, M, Ferrando-Villalba, P, Rodríguez-Tinoco, C, Garcia, G, Rodríguez-Viejo, J, Peral, I, Lopeandía, AF
JournalJournal of Synchrotron Radiation
Volume22
Issue3
Pàgines717–722
Date PublishedMay
Keywordsnanocalorimetry, thin-film stack, WAXS
Resum

The use of a membrane-based chip nanocalorimeter in a powder diffraction beamline is described. Simultaneous wide-angle X-ray scattering and scanning nanocalorimetric measurements are performed on a thin-film stack of palladium/amorphous silicon (Pd/a-Si) at heating rates from 0.1 to 10Ks${\sp {$-$}1}$. The nanocalorimeter works under a power-compensation scheme previously developed by the authors. Kinetic and structural information of the consumed and created phases can be obtained from the combined techniques. The formation of Pd${\sb 2}$Si produces a broad calorimetric peak that contains overlapping individual processes. It is shown that Pd consumption precedes the formation of the crystalline Pd${\sb 2}$Si phase and that the crystallite size depends on the heating rate of the experiment.

URLhttp://dx.doi.org/10.1107/S1600577515004683
DOI10.1107/S1600577515004683
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